Zobrazit minimální záznam

Charge transport in semi insulating bulk 4H-Silicon carbide: Effect of metallization and wafer homogeneity

dc.contributor.authorPraus, Petr
dc.contributor.authorBetušiak, Marián
dc.contributor.authorBelas, Eduard
dc.contributor.authorKunc, Jan
dc.contributor.authorGrill, Roman
dc.contributor.authorBrynza, Mykola
dc.contributor.authorPipek, Jindřich
dc.date.accessioned2024-01-26T10:10:41Z
dc.date.available2024-01-26T10:10:41Z
dc.date.issued2022
dc.identifier.urihttps://hdl.handle.net/20.500.14178/2220
dc.description.abstractWe investigated the effect of metallization and spatial homogeneity on the charge collection of sensors prepared from high purity semi-insulating 4H-SiC bulk wafer. We used Au, Ni, Cr or graphene electrical contacts subsequently prepared on the same chip. We also tested sensors prepared from different positions on the wafer. Laser-induced transient current technique (L-TCT) and alpha spectroscopy were used to characterize the charge transport in the sensors. It was found that different sensors polarize at DC bias in the time interval of 0.2-270 s. We observed significant deviation of current transients measured on the sensor with a graphene contact from the sensors with metal contacts, which is attributed to the surface plasmon formed on the graphene-SiC interface. We demonstrated that the sensor polarization is independent of the metallization, whereas it strongly depends on the location on the wafer from which the sensor was cut. This testifies to a significant spatial inhomogeneity of the wafer. We also tested the electrical current relaxation after step-DC biasing as a simple method for the characterization of the sensor polarization. We found that the relaxation profile has extremes in the similar positions as the L-TCT profiles of collected charge. We also showed that using pulse biased L-TCT we are able to choose suitable sensors with slow polarization and to design optimal pulsing conditions including necessary depolarization times for the alpha spectroscopy measurement and L-TCT techniques to achieve long-term stable charge collection. In case of 241Am alpha spectroscopy charge collection efficiency 5-24 % was observed. We framed up model depicting all observed phenomena assuming the space charge formation induced by a blocking cathode in an n-type material and related lifetime reduction. We evaluated the space charge formed in the sensors after 10^4 s biasing, which ranged from 1.7 x 10^14 cm^-3 to 7 x 10^14 cm^-3 in respective sensors.en
dc.language.isoen
dc.relation.urlhttps://doi.org/10.1016/j.rinp.2022.106110
dc.rightsCreative Commons Uveďte původ-Neužívejte dílo komerčně-Nezpracovávejte 4.0 Internationalcs
dc.rightsCreative Commons Attribution-NonCommercial-NoDerivativeWorks 4.0 Internationalen
dc.titleCharge transport in semi insulating bulk 4H-Silicon carbide: Effect of metallization and wafer homogeneityen
dcterms.accessRightsopenAccess
dcterms.licensehttps://creativecommons.org/licenses/by-nc-nd/4.0/legalcode
dc.date.updated2024-01-26T10:10:41Z
dc.subject.keyword4H-SiCen
dc.subject.keywordAlpha spectroscopyen
dc.subject.keywordMetallizationen
dc.subject.keywordPolarization effecten
dc.subject.keywordTime of Flighten
dc.relation.fundingReferenceinfo:eu-repo/grantAgreement/GA0/GA/GA18-12449S
dc.relation.fundingReferenceinfo:eu-repo/grantAgreement/UK/GAUK/GAUK379621
dc.relation.fundingReferenceinfo:eu-repo/grantAgreement/UK/COOP/COOP
dc.date.embargoStartDate2024-01-26
dc.type.obd73
dc.type.versioninfo:eu-repo/semantics/publishedVersion
dc.identifier.doi10.1016/j.rinp.2022.106110
dc.identifier.utWos000927573000001
dc.identifier.eidScopus2-s2.0-85141988205
dc.identifier.obd620329
dc.identifier.rivRIV/00216208:11320/22:10452670
dc.subject.rivPrimary10000::10300::10302
dcterms.isPartOf.nameResults in Physics [online]
dcterms.isPartOf.issn2211-3797
dcterms.isPartOf.journalYear2022
dcterms.isPartOf.journalVolume43
dcterms.isPartOf.journalIssueDecember
uk.faculty.primaryId116
uk.faculty.primaryNameMatematicko-fyzikální fakultacs
uk.faculty.primaryNameFaculty of Mathematics and Physicsen
uk.department.primaryId1191
uk.department.primaryNameFyzikální ústav UKcs
uk.department.primaryNameInstitute of Physics of Charles Universityen
dc.type.obdHierarchyCsČLÁNEK V ČASOPISU::článek v časopisu::původní článekcs
dc.type.obdHierarchyEnJOURNAL ARTICLE::journal article::original articleen
dc.type.obdHierarchyCode73::152::206en
uk.displayTitleCharge transport in semi insulating bulk 4H-Silicon carbide: Effect of metallization and wafer homogeneityen


Soubory tohoto záznamu

Thumbnail

Tento záznam se objevuje v následujících kolekcích

Zobrazit minimální záznam