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Wet etching of gold on graphene for high-quality resist-free graphene surfaces

dc.contributor.authorKunc, Jan
dc.contributor.authorShestopalov, Mykhailo
dc.contributor.authorJo, J.
dc.contributor.authorPark, K.
dc.date.accessioned2024-03-04T09:13:22Z
dc.date.available2024-03-04T09:13:22Z
dc.date.issued2023
dc.identifier.urihttps://hdl.handle.net/20.500.14178/2344
dc.description.abstractWet etching of gold on graphene is challenging due to the weak adhesion of the resist mask to graphene. We report an operating procedure for alkali ion-free wet etching of gold on graphene using a mixture of hydrochloric and nitric acids (aqua regia) with a high lateral resolution down to 100 nm. We investigate the role of positive and negative resists, electron beam lithography (EBL) dose, hard-bake, oxygen etching, aging, and sensitivity to the etch parameters, such as the freshness of dilute aqua regia, etch time, and the order of etched samples. The negative-tone resist provides the best results. The over-dosed EBL exposure can enhance the resist adhesion, as hard-bake below the glass-transition temperature and well-defined wet etch of the resist-residua-free gold surface. We also present a cleaning procedure to avoid bubble formation after the hard bake. Our results demonstrate that wet etching of gold on graphene using aqua regia is a viable method for achieving high-quality resist-free graphene surfaces. This method has potential applications in graphene nanoelectronics and nanophotonics, where high-quality graphene surfaces are essential for device performance.en
dc.language.isoen
dc.relation.urlhttps://doi.org/10.1088/2632-959X/acef45
dc.rightsCreative Commons Uveďte původ 4.0 Internationalcs
dc.rightsCreative Commons Attribution 4.0 Internationalen
dc.titleWet etching of gold on graphene for high-quality resist-free graphene surfacesen
dcterms.accessRightsopenAccess
dcterms.licensehttps://creativecommons.org/licenses/by/4.0/legalcode
dc.date.updated2024-03-04T09:13:22Z
dc.subject.keywordwet etching of gold on grapheneen
dc.subject.keywordover-exposureen
dc.subject.keywordhard-bakeen
dc.subject.keywordpost-development bakeen
dc.subject.keywordaqua regia wet etchen
dc.subject.keywordbubble formation and eliminationen
dc.subject.keywordresist adhesion enhancementen
dc.relation.fundingReferenceinfo:eu-repo/grantAgreement/GA0/GC/GC21-28470J
dc.relation.fundingReferenceinfo:eu-repo/grantAgreement/UK/COOP/COOP
dc.date.embargoStartDate2024-03-04
dc.type.obd73
dc.type.versioninfo:eu-repo/semantics/publishedVersion
dc.identifier.doi10.1088/2632-959X/acef45
dc.identifier.utWos001057452200001
dc.identifier.eidScopus2-s2.0-85169977970
dc.identifier.obd640832
dc.subject.rivPrimary10000::10300::10302
dcterms.isPartOf.nameNano Express
dcterms.isPartOf.issn2632-959X
dcterms.isPartOf.journalYear2023
dcterms.isPartOf.journalVolume4
dcterms.isPartOf.journalIssue3
uk.faculty.primaryId116
uk.faculty.primaryNameMatematicko-fyzikální fakultacs
uk.faculty.primaryNameFaculty of Mathematics and Physicsen
uk.department.primaryId1191
uk.department.primaryNameFyzikální ústav UKcs
uk.department.primaryNameInstitute of Physics of Charles Universityen
dc.type.obdHierarchyCsČLÁNEK V ČASOPISU::článek v časopisu::původní článekcs
dc.type.obdHierarchyEnJOURNAL ARTICLE::journal article::original articleen
dc.type.obdHierarchyCode73::152::206en
uk.displayTitleWet etching of gold on graphene for high-quality resist-free graphene surfacesen


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