dc.contributor.author | Kunc, Jan | |
dc.contributor.author | Shestopalov, Mykhailo | |
dc.contributor.author | Jo, J. | |
dc.contributor.author | Park, K. | |
dc.date.accessioned | 2024-03-04T09:13:22Z | |
dc.date.available | 2024-03-04T09:13:22Z | |
dc.date.issued | 2023 | |
dc.identifier.uri | https://hdl.handle.net/20.500.14178/2344 | |
dc.description.abstract | Wet etching of gold on graphene is challenging due to the weak adhesion of the resist mask to graphene. We report an operating procedure for alkali ion-free wet etching of gold on graphene using a mixture of hydrochloric and nitric acids (aqua regia) with a high lateral resolution down to 100 nm. We investigate the role of positive and negative resists, electron beam lithography (EBL) dose, hard-bake, oxygen etching, aging, and sensitivity to the etch parameters, such as the freshness of dilute aqua regia, etch time, and the order of etched samples. The negative-tone resist provides the best results. The over-dosed EBL exposure can enhance the resist adhesion, as hard-bake below the glass-transition temperature and well-defined wet etch of the resist-residua-free gold surface. We also present a cleaning procedure to avoid bubble formation after the hard bake. Our results demonstrate that wet etching of gold on graphene using aqua regia is a viable method for achieving high-quality resist-free graphene surfaces. This method has potential applications in graphene nanoelectronics and nanophotonics, where high-quality graphene surfaces are essential for device performance. | en |
dc.language.iso | en | |
dc.relation.url | https://doi.org/10.1088/2632-959X/acef45 | |
dc.rights | Creative Commons Uveďte původ 4.0 International | cs |
dc.rights | Creative Commons Attribution 4.0 International | en |
dc.title | Wet etching of gold on graphene for high-quality resist-free graphene surfaces | en |
dcterms.accessRights | openAccess | |
dcterms.license | https://creativecommons.org/licenses/by/4.0/legalcode | |
dc.date.updated | 2024-03-04T09:13:22Z | |
dc.subject.keyword | wet etching of gold on graphene | en |
dc.subject.keyword | over-exposure | en |
dc.subject.keyword | hard-bake | en |
dc.subject.keyword | post-development bake | en |
dc.subject.keyword | aqua regia wet etch | en |
dc.subject.keyword | bubble formation and elimination | en |
dc.subject.keyword | resist adhesion enhancement | en |
dc.relation.fundingReference | info:eu-repo/grantAgreement/GA0/GC/GC21-28470J | |
dc.relation.fundingReference | info:eu-repo/grantAgreement/UK/COOP/COOP | |
dc.date.embargoStartDate | 2024-03-04 | |
dc.type.obd | 73 | |
dc.type.version | info:eu-repo/semantics/publishedVersion | |
dc.identifier.doi | 10.1088/2632-959X/acef45 | |
dc.identifier.utWos | 001057452200001 | |
dc.identifier.eidScopus | 2-s2.0-85169977970 | |
dc.identifier.obd | 640832 | |
dc.subject.rivPrimary | 10000::10300::10302 | |
dcterms.isPartOf.name | Nano Express | |
dcterms.isPartOf.issn | 2632-959X | |
dcterms.isPartOf.journalYear | 2023 | |
dcterms.isPartOf.journalVolume | 4 | |
dcterms.isPartOf.journalIssue | 3 | |
uk.faculty.primaryId | 116 | |
uk.faculty.primaryName | Matematicko-fyzikální fakulta | cs |
uk.faculty.primaryName | Faculty of Mathematics and Physics | en |
uk.department.primaryId | 1191 | |
uk.department.primaryName | Fyzikální ústav UK | cs |
uk.department.primaryName | Institute of Physics of Charles University | en |
dc.type.obdHierarchyCs | ČLÁNEK V ČASOPISU::článek v časopisu::původní článek | cs |
dc.type.obdHierarchyEn | JOURNAL ARTICLE::journal article::original article | en |
dc.type.obdHierarchyCode | 73::152::206 | en |
uk.displayTitle | Wet etching of gold on graphene for high-quality resist-free graphene surfaces | en |